Corning’s HPFS® ArF Grade Fused Silica (HPFS) Microlithography Lens Blanks are known throughout the semiconductor industry for their consistent, repeatable performance. From projection and illuminator lens blanks to leading-edge photomask materials, Corning semiconductor optics embody industry-leading characteristics that include homogeneity, low birefringence, large diameter, and outstanding transmittance in the infrared, visible, ultraviolet, and deep-ultraviolet ranges, all of which are critical to our customers’ needs.
Products Include: HPFS® KrF Lens Blank HPFS® ArF Lens Blank ULE® - Ultra Low Expansion for extreme ultraviolet (EUV)
Additional Information: KrF-Grade Product Information Sheet ArF-Grade Product Information Sheet 8650 ArF-Grade 193mn Immersion Lithography Product Information Sheet ULE Product Information Sheet
Additional Resources: Laser Resistance of Fused Silica for Microlithography: Experiments and Models Lifetime Modeling of Laser-Induced Density and Refractive Index Changes in Fused Silica Used in DUV Microlithography Characterization and Characteristics of a ULE Glass Tailored for the EUVL Needs Improved Characteristics of ULE Glass for Meeting EUVL Needs Ultra-High Accuracy Measurement of the Coefficient of Thermal Expansion for Ultra Low Expansion Materials
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